S. ParkS. LeeJ. ChoiS. E. Kim
Ar/N2 2-step plasma treatment on SiO2 for hybrid bonding
Best Poster AwardKMEPS 2023
S. LeeS. ParkJ. ChoiS. E. Kim
Study of Cu bonding using matel nanolayer
KMEPS 2023
S. E. Kim
Recent Advances and Trends in Heterogeneous Integration (Invited Talk)
KMEPS 2023
S. LeeJ. ChoiG. OhY. KimS. E. Kim
Investigation of Cu-to-Cu and oxide-to-oxide bonding
IEEE ECTC 2023
S. E. Kim
Hybrid Cu Bonding (Invited Talk)
IEIE 2023
S. LeeJ. ChoiG. OhS. ParkS. E. Kim
Effect of particle removal on Cu and oxide surface of PR in dicing process for die-to-wafer bonding
KSC 2023
S. ParkC. KimG. OhY. S. YunJ. KangS. E. KimW. Lee
Effect of Cu Pad Dimension on Cu/SiCN Hybrid Bonding Process: A Finite Element Analysis Study
KSC 2023
2022
S. LeeG. OhS. ParkY. KimS. E. Kim
Properties of various plasma surface treatments for oxide-oxide bonding in 3D integration
ISMP 2022
G. OhC. KimW. LeeJ. KangJ. ParkY. YunS. E. Kim
Cu/Oxide Hybrid Bonding Analysis by Finite Element Modeling
ISMP 2022
S. ParkY. KimK. OhS. E. Kim
Cu-to-Cu bonding quality analysis through diffusion between titanium nano passivation and copper Conference
KMEPS 2022
Y. KimS. ParkS. E. Kim
Analysis of Cu-Cu wafer bonding using Ag nano passivation Conference
KMEPS 2022
S. ParkY. KimS. E. Kim
Low temperature copper wafer bonding using titanium nano passivation
Top Outstanding Paper AwardKCS 2022
Y. KimS. ParkS. E. Kim
Low-temperature Cu-Cu wafer bonding using Ag nanolayer
KCS 2022
S. ParkY. KimY. ParkK. OhS. E. Kim
Ni 프로브 핀에 damage가 없는 고선택비의 Cu/Ni 습식 식각 공정
KCS 2022
2021
S. ParkY. KimY. ParkS. E. Kim
Characteristics of Ti Nano Passivation for Low Temperature Cu Bonding
ISMP 2021
Y. ParkK. OhS. ParkY. KimS. E. Kim
Highly Selective Cu Etching in Cu/Ni Layer Structures for Probe Pin Fabrication
ISMP 2021
Y. KimS. ParkS. E. Kim
Low temperature Cu-Cu bonding using Ag nanolayer
ISMP 2021
Y. KimS. ParkH. ParkH. SeoS. E. Kim
Experimental Characterization of Cu-to-Cu Bonding
Best Poster AwardThe Korean Conference on Semiconductor 2021
H. ParkS. ParkY. KimS. E. Kim
Cu-Cu Bonding using Optimized Copper Nitride Passivation for 3D Packaging Applications
IEEE IITC 2021
S. ParkY. KimS. E. Kim
Effect of Titanium Thin Films on Low Temperature Copper Bonding
KMEPS 2021
H. ParkS. ParkY. KimS. E. Kim
Evaluation of Cu bonding using Ag nanolayer and their diffusion
KMEPS 2021
S. ChoiG. KimH. ParkS. E. KimY. Park
3차원 직접 접합을 위한 Ar/N2 2단계 플라즈마 처리 조건에 따른 Cu-Cu접합 특성 평가
KMEPS 2021
2020
H. ParkH. SeoG. KimY. B. ParkS. E. Kim
Copper surface passivation for low temperature Cu-to-Cu bonding applications
ECS PRiME 2020
H. SeoH. ParkS. E. Kim
Study of plasma treatments and planarization process for characteristics required for wafer-level Cu-to-Cu hybrid bonding
IEEE ECTC 2020
H. ParkH. SeoM. ParkS. E. Kim
Development of CMOS-compatible low temperature Cu bonding optimized by the response surface methodology
IEEE ECTC 2020
H. ParkS. ParkS. E. Kim
Optimization of oxidation-free Cu bonding using the design of experiment method
ENGE 2020
H. SeoY. KimG. KimY. B. ParkS. E. Kim
Characterizations of copper nitride passivated surface for Cu bonding
ENGE 2020
Y. KimS. ParkH. ParkS. E. Kim
Copper bonding at 260oC using nitrogen plasma process
KMAPS 2020
S. ParkY. KimH. SeoS. E. Kim
Persistence analysis of copper nitride passivation for Cu bonding application
KMAPS 2020
S. ChoiG. KimH. SeoS. E. KimY. B. Park
Quantittive interfacial adhesion energy and analysis of Ar/N2 two-step plasma treatment for low temperature Cu direct bonding
KMAPS 2020
S. ParkY. KimH. ParkS. E. Kim
A study of Cu bonding using copper nitride for 3D packaging
ISE 2020
2019
S. E. Kim
Plasma process optimization for Cu bonding integration using the design of experiment technique
IEEE EPTC 2019
H. SeoH. ParkandS. E. Kim
Comparative Study of Plasma Treatment on Sputtered and Electroplated Cu Surfaces for Cu-to-Cu Bonding Best Poster AwardISMP-EMAP 2019
G. KimK. SonH. SeoS. E. KimY. Park
Copper Nitride Passivation by Ar-N2 Two Step Plasma Treatments for Low-Temperature Copper Bonding
ISMP-EMAP 2019
H. ParkH. SeoandS. E. Kim
Ar/N2 plasma treatment effect on qualtitative interfacial adhesion energy of sputtered Cu direct bonding for 3D integration
ISMP-EMAP 2019
H. SeoH. ParkandS. E. Kim
Effects of argon and nitrogen ion bombardments on sputtered and electroplated Cu surfaces for Cu boning application
IEEE 3DIC
H. ParkH. SeoandS. E. Kim
Characterization of nitride passivaed Cu surface for low temperature CU-Cu bonding
IEEE 3DIC
H. ParkH. SeoandS. E. Kim
Effect of nitride passivation on Cu surface for low temperature Cu-to-Cu bonding
IEEE LTB-3D
H. ParkS. E. Kim
Study of Ar-N2 plasma treated Cu surface for low temperature Cu-Cu wafer bonding
KCS 2019
2018
H. ParkandS. E. Kim
Effect of Ar-N2 Plasma Treatment on Copper Surface for Cu-Cu Wafer Bonding Best Interactive Poster AwardIEEE EPTC 2018
C. SongS. KimandS. E. Kim
Study of polysilsesquioxane dielectric for the use of multi-structured redistribution layers in fan-out wafer level packaging applications
IEEE EPTC 2018
H. ParkandS. E. Kim
Characterization of Cu surfaces by plasma treatment for wafer bonding applications
ISMP 2018
C. SongS. KimandS. E. Kim
Synthesis and characterization of positive-type spin-on hybrid material for dielectric application in fan out wafer level packaging Best Poster awardISMP 2018
C. SongS. KimandS. E. Kim
Study of photo-definable organic-inorganic spin-on dielectric use for FOWLP applications
IUMRS-ICEM 2018
H. ParkandS. E. Kim
Study of plasma treated Cu surface for Cu wafer bonding applications
IUMRS-ICEM 2018
C. SongS. KimandS. E. Kim
Fabrication and characteristics of spin-on glass for multi-level interconnect in WLP
IEEE ECTC 2018
C. SongS. KimandS. E. Kim
Study on photodefinable hybrid dielectrics for WLP applications
KMAPS 2018
C. SongS. KimandS. E. Kim
Evaluation of spin-on glass for a dielectric use in multilayer wafer level packaging
KCS 2018
S. ChoS. KimandS. E. Kim
Effect of Si mechanical grinding on the electrical properties of oxide semiconductor thin film on Si substrate
KCS 2018
2017
C. SongS. KimandS. E. Kim
Process Assessment of Spin-On-Glass in Wafer Level Packaging Interconnect
KMRS-F 2017
S. ChoS. KimandS. E. Kim
Influence of different Si substrate thicknesses on electrical properties of p-channel SnO TFT
KMRS-F 2017
C. SongS. KimandS. E. Kim
Evaluation of spin-on dielectric for use in wafer level packaging interconnect
ISMP 2017
S. ChoC. KimS. KimandS. E. Kim
Effect of Si substrate thickness on electrical properties of p-channel SnO TFT
ISMP 2017
J. PyunS. HanmS. E. KimandS. Kim
Planarization characteristics of polymer interlayer dielectricfor FOWLP applications
ISMP 2017
C. SongJ. PyunS. HanS. KimandS. E. Kim
Effect of wet etching on various barrier materials for fine pitch redistribution layers
KMRS-S 2017
S. ChoC. KimS. KimandS. E. Kim
Influence of different targets on electrical, optical, and structural properties of sputter deposited thin oxide thin films
KMRS-S 2017
C. SongJ. PyunS. HanS. KimandS. E. Kim
Study of sputtered Ti/Cu barrier/seed etching for fine pitch EDG structures
KMAPS 2017
K. OhC. YoonJ. SonandS. E. Kim
Warpage characteristic analysis on packaged chip after thermocompression reliability test
KMAPS 2017
Y. WonandS. E. Kim
Micro-fabrication of Si liquid cooling structure and its thermal characteristic analysis Best Poster AwardKCS 2017
C. KimS. KimandS. E. Kim
The effect of annealing on the structural and electrical properties of sputter-deposited SnOx thin films by a composite target
KCS 2017
2016
C. KimY. WonS. KimandS. E. Kim
Effect of vacuum annealing on transparent SnOx thin films produced by sputtering of SnO/Sn composite target
TCN 2016
C. KimY. WonS. KimandS. E. Kim
Comparative analysis of SnOx thin films deposited by reactive sputtering in different SnO/Sn target compositions
TCM 2016
Y. WomS. KimandS. E. Kim
Single-phase liquid cooling of silicon chips for high power density microelectronics
ISMP 2016
Y. NamS. E. KimandS. Kim
Hydrogen plasma treatment of Cu oxide for Cu-Cu direct bonding application
ISMP 2016
Y. Won S. Kim,
and
S. E. Kim
Characteristics of micro-channel liquid cooling system with various metal heat spreaders and coolants
KCS 2016
C. KimS. KimandS. E. Kim
Characterization of p-type SnO thin films with SnO/Sn composite target for transparent device applications
KCS 2016
Y. WonS. KimandS. E. Kim
Effects of micro-channel liquid cooling with Cu or Ag bumps for IC thermal management Best Poster AwardKMRS 2016
C. KimS. KimandS. E. Kim
Effects of SnO/Sn composite target on rf reactive sputtered p-type SnO thin films
KMRS 2016
2015
Y. ShinJ. MaS. KimandS. E. Kim3D IC thermal management using Cu filled TSVsKSC 2015
M. ParkS. BaekS. KimandS. E. Kim
Liquid cooling system with TSV for high power 3D packages Best Poster AwardKCS 2015
Y. WonS. E. Kim
The characteristics of liquid cooling module fabricated on Si wafer with micro-channel and TSV
KMRAS 2015
C. KimS. E. Kim
Structural, electrical. and optical properties of SnO thin film grown by RF sputtering of SnO /Sn composite target Best Poster AwardKMRS 2015
M. ParkS. KimandS. E. Kim
Experimental characterization of TSV liquid cooling for 3D integration
IITC MAM 2015
C. KimS. KimandS. E. Kim
Tin oxide deposited via RF sputtering with SnO/Sn composite target
ISMP 2015
Y. WonM. ParkS. KimandS. E. Kim
Fabrication of on-chip liquid cooling system for 3D IC thermal management Best Poster AwardISMP 2015
Y. WonM. ParkS. KimandS. E. Kim
On-Chip liquid cooling solution for high power IC devices
ADMETA 2015
2014
C. KimS. E. Kim
Stability study of p-type SnO thin film deposited by reactive rf sputtering
KMRS 2014
J.M. ParkS. BaekS. E. Kim
Direct wafer cooling evaluation with TSV and Si micro-channels
KMRS 2014
C. KimS. KimS. E. Kim
Reliability evaluation of p-type SnO thin film deposited on Si substrate of various
thickness
KMAPS 2014
S. BaeM. ParkS. KimS. E. Kim
Experimental study of liquid cooling system with TSV and micro-channels
KMAPS 2014
S. KimS. E. KimS. Kim
High volume manufacturing challenges and opportunities for wafer level vertical interconnection
KMAPS 2014
Y. ShinJ. MaS. E. KimS. Kim
THermal management study for hot spot cooling in 3D ICs
KMAPS 2014
Y. NamS. E. KimS. Kim
Effect of surface plasma treatment using forming gas on Cu direct bonding
KMAPS 2014
M. ParkS. BaekS. KimS. E. Kim
Surface plasma treatment of Cu interconnect for Cu bonding in 3D integration and their characteristics
IUMRS 2014
M. ParkJ. MaS. NaekS. KimS. E. Kim
Development of TSV liquid cooling structure for 3D integration
IUMRS 2014
S. KimY. SHinJ. LeeS. E. KimS. Kim
Wafer level Cu-Cu direct bonding with TSV in 3D integration
IUMRS 2014
2013
J. UmS. E. Kim
homojunction pn diode using tin oxide nanocrystalline thin film deposited via sputtering
ICSS 2013
J. MaS. ShinS. E. Kim
Characterization of micro flip-chip ABL structure for high power IC devices
ICSS 2013
I. SongM. LeeS. E. KimS. Kim
Development of Cu CMP process for Cu-to-Cu wafer stacking Best Poster AwardEMAP 2013
S. ShinS. H. KimS. E. KimS. Kim
Evaluation of wafer warpage in 3D stacking technology
EMAP 2013
M. ParkS. H. KimJ. MaS. ShinI. SongM. LeeS. Y. KimS. KimS. E. Kim
Characterization and fabrication of wafer level 3D stacking
EMAP 2013
J. MaS. ShinS. KimS. E. Kim
Feasibility of micro ABL bumps with flip chip process for high power devices and 3D interconnection
KMAPS 2013
M. LeeS. E. KimS. Kim
Assessment of wafer level CU-Cu bonding process Best Poster AwardKMAPS 2013
S. E. Kim
Challenges of 3D IC manufacturing
KSPE 2013
J. UmS.E. Kim
Properties of annealed tin oxide thin films and their homojunction pn diode application
KMRS 2013
M. ParkS. E. Kim
Study of Ar plasma treatment on Cu interconnect surface for Cu bonding in 3D integration Best Poster AwardKMRS 2013